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?JC系列磁控濺射鍍膜機(jī)
  • 用途及特點(diǎn)
  • 規(guī)格參數(shù)
    JC系列用途及特點(diǎn)
    Use and Features
     
    ●磁控濺射鍍膜設(shè)備主要用于在基片上鍍制金屬、半導(dǎo)體、電介質(zhì)、多元素化合物或混和物。利用濺射法可制備金屬膜、半導(dǎo)體膜、絕緣膜、硬質(zhì)膜、耐熱膜、耐腐蝕膜、超導(dǎo)膜、磁性膜、光學(xué)膜等各種特殊性能的薄膜。
    ●基片尺寸適應(yīng)范圍廣，可鍍制多種材料，工藝可控性好、靈活性強(qiáng)、重復(fù)性高、基片溫升小、膜層附著力強(qiáng)，計(jì)算機(jī)全自動(dòng)控制，******性高。且安裝維護(hù)方便，占地位置小。
    JC系列磁控濺射鍍膜機(jī)
    Series JC Magnetron Sputtering Coater
     
    主要機(jī)型及參數(shù)
    Main models and parameters
    型號(hào)
    Model    		 應(yīng)用特點(diǎn)
    Application field    		 裝片工作臺(tái)特點(diǎn)
    Features of film loading bench    		 基片尺寸
    Size of substrate    		 產(chǎn)量/每小時(shí)
    1μ鋁層厚度
    Output per hour 1μm aluminum coating thickness    		 厚度
    均勻性
    thickness homogeneity    		 真空系統(tǒng)
    Vacuum system
    JC400-1/D 適合科研、生產(chǎn)硅片及砷化鎵片
    Scientific research,production of silicon film and gallium arsenide film    		 全自動(dòng)盒對(duì)盒送片，濺射源數(shù)量可按工藝調(diào)整，低塵粒
    Full automatic box-to-box film advance;quantity of sputtering source to be adiusted as per the process;low in density of dust particles    		 4～6″ 40 ±5％ 低溫泵加
    分子泵系統(tǒng)
    Cryogenic pump system added with molecular pump
    JC500-1/D 適用于圓形片狀工件
    Circular sheet work-piece    		 工件可進(jìn)行公轉(zhuǎn)，水平裝片
    Revolution of work-piece available；horizontal film loading    		 4″ 16 ±8％ 分子泵系統(tǒng)
    Turbomolecular pump system
    JC500-5/D 適用于矩形片狀工件
    Rectangular sheet work-piecevv    		 工件可進(jìn)行公轉(zhuǎn)，垂直裝片
    Revolution of work-piece available；vertical film loading    		 150x150mm 10 ±8％ 分子泵系統(tǒng)
    Turbomolecular pump system
    JC600-1/D 適用于矩形片狀工件
    Rectangular sheet work-piecevv    		 工件架為十邊拄形，垂直裝片
    work-piece holder in decagonal column shape；vertical film loading    		 280x100mm 20 ±8％ 擴(kuò)散泵系統(tǒng)
    Diffusion pump system
    JC600-2/D 適合科研、生產(chǎn)砷化鎵基片線寬亞微米級(jí)
    Scientific research,production of gallium arsenide film with line width at submicron level    		 工件可進(jìn)行自傳、公轉(zhuǎn)
    水平裝片
    Rotation and revolution of work-piece available；horizontal film loading    		 3″ 24 ±5％ 低溫泵系統(tǒng)
    Cryogenic pump system
    JC650-1/D 適用于矩形或圓形片狀工件
    Rectangular or circular sheet work-piece    		 工件可進(jìn)行公轉(zhuǎn)，水平裝片
    revolution of work-piece available；horizontal film loading    		 Φ100mm 10 ±5％ 分子泵系統(tǒng)
    Turbomolecular pump system
     

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